Semiconductor wafer cleaning (wet bench) process

Photoresist solvent removal by heating

Deionized water heating for wafer washing

Air and nitrogen heating for wafer drying

Heating acid, IPA, Piranha, NMP, etc.

Use with one way or recirculation system

Features and advantages:

The flow path has no contact with the heating element

The medium is isolated in a PFA (Teflon) flow tube (high purity heating)

Allow safe heating of hazardous liquids and gases

Flow tube can be safely used for a variety of corrosive solvents

Flow tube can be replaced on site (no need to call service phone)

Compatible with standard control (PID, PLC, multi-loop, etc.)

The main body is coated with Teflon to achieve the greatest degree of cleanliness

Self-discharge flow tube and long life heating element